作者: Derrick T. Carpenter
DOI:
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摘要: In an embodiment, a method of forming anti-reflective surface includes providing conditions for plasma, and exposing organic-inorganic optical material to the plasma. A treated formed thereby exhibits lower reflectivity relative prior step exposing, surface. depositing etch mask on material, plasma such that etches preferentially over mask, using form having plasma-affected zone. The said forms