Mitigation of detrimental breakdown of a high dielectric constant metal-insulator-metal capacitor in a capacitor bank

摘要: An IC capacitor bank includes a plurality of high-k metal-insulator-metal (MIM) capacitors connected to pair conductive traces. A fusible trace located on an end one the traces forms column between supply lines, such that failure dielectric in MIM causes at least partially open thereby limiting fault current column. Additionally, method manufacturing providing and locating form is