Multi-electron beam exposure method and apparatus
作者： Yoshikiyo Yui , Haruo Yoda , Yasunari Souda , Shinichi Hashimoto , Hiroya Ohta
DOI:
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摘要: A multi-electron beam exposure method and apparatus, wherein electron beams are applied to a sample surface mounted on traveling stage perform repeated of chip patterns. An region the is partitioned into multiple stripe regions having width in an x-axis direction, each further main fields y-axis direction. At least one widths x- directions set value, pattern data for based stored as unit. The readout number times corresponding chips repeatedly, provides same chips.
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