Nanolithography Study Using Scanning Probe Microscope

摘要: Recently, the interest to design useful nanostructures in science and technology has rapidly increased these technologies will be superior for fabrication of (Iwanaga & Darling, 2005; Martin et al., Sadegh Hassani 2010). The patterning material this scale is one great importances future lithography order attain higher integration density semiconductor devices (Sadegh Sobat, 2011). Conventional techniques, i.e., those divided optical electron beam are either cost-intensive or unsuitable handle large variety organic biological systems available nanotechnology. Hence, various driving forces have been considered development nanofabrication techniques (Geissler Xia, 2004; Quate, 1997; Applying started approximately since 1990 it given rise establishment different nanolithography methods, which most important method scanning probe based lithography. An interesting way performing nanometer pattern direct scratching a sample surface mechanically by probe. controlled features with microscope (SPM) known as (SPL) (Irmer 1998). Many reports presented about lithographic methods technique (Garcia, Garcia, 2006). SPL would also ideal evaluation mechanical characteristic surfaces. Scanning microscopy, such tunneling microscopy (STM) atomic force (AFM), become standard obtaining topographical images resolution (Hyon 1999). In addition, may used study friction force, adhesion modifying (Sundararajan Bhushan, 2000; Burnham 1991; Aime 1994; Ebrahimpoor Ziaie, 2006; Ziaie 2008). Manipulating surfaces, creating assembly, fabricating chemical patterns characterizing properties materials regime enabled 1999; 2011; Bouchiat Esteve, 1996). Nanolithography AFM tool fabricate nanometer-scale structures at least lateral dimension between size an individual atom 100 nm on silicon other surfaces (Wilder This during leading edge integrated circuits (Sugimura Nakagiri, 1997)