A study of silicon tetrafluoride reduction with hydrogen in radiofrequency discharge
作者： P. G. Sennikov , S. V. Golubev , R. A. Kornev , L. A. Mochalov , A. A. Shilaev
DOI: 10.1134/S0018143914010123
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摘要: The process of plasma-chemical conversion silicon tetrafluoride in a radiofrequency (13.56 MHz) discharge has been studied. dependence the yield on specific energy input and H2/SiF4 molar ratio examined pressure range 0.1–0.3 Tort. maximum is 60%, optimal consumption 44.6 MJ per mole Si. A mechanism proposed for plasma-assisted reduction under given experimental conditions.
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