Plasma assisted deposition of nanocrystalline BCN thin films and property characterization

作者: Z. X. Cao , L. M. Liu , H. Oechsner

DOI: 10.1116/1.1518973

关键词:

摘要: … plasma assisted CVD method.… BCN thin films were grown using the ECWR plasma assisted deposition method. In the applied energy window, the films prepared with nitrogen plasma …

参考文章(21)
Masahiro Mieno, Tadao Satoh, Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane Journal of Materials Science. ,vol. 36, pp. 3925- 3931 ,(2001) , 10.1023/A:1017966004367
M. Nesl�dek, M. Van??ek, K. Meykens, K. Haenen, J. Manca, L. De Schepper, E. Pace, A. Pini, G. Verona Rinati, C. Kimura, Y. Etou, T. Sugino, Study of UV and subgap photocurrent response in diamond and BCN thin films for detector applications Physica Status Solidi (a). ,vol. 185, pp. 107- 113 ,(2001) , 10.1002/1521-396X(200105)185:1<107::AID-PSSA107>3.0.CO;2-2
K. Montasser, S. Hattori, S. Morita, Transparent BCNH thin films formed by plasma chemical vapour deposition Thin Solid Films. ,vol. 117, pp. 311- 317 ,(1984) , 10.1016/0040-6090(84)90361-4
Walter R. L. Lambrecht, Benjamin Segall, Anomalous band-gap behavior and phase stability of c-BN-diamond alloys. Physical Review B. ,vol. 47, pp. 9289- 9296 ,(1993) , 10.1103/PHYSREVB.47.9289
R. Gago, I. Jiménez, J. M. Albella, L. J. Terminello, Identification of ternary boron–carbon–nitrogen hexagonal phases by x-ray absorption spectroscopy Applied Physics Letters. ,vol. 78, pp. 3430- 3432 ,(2001) , 10.1063/1.1376428
S. Ulrich, T. Theel, J. Schwan, H. Ehrhardt, Magnetron-sputtered superhard materials Surface & Coatings Technology. ,vol. 97, pp. 45- 59 ,(1997) , 10.1016/S0257-8972(97)00159-X
Amy Y. Liu, Renata M. Wentzcovitch, Marvin L. Cohen, Atomic arrangement and electronic structure of BC 2 N Physical Review B. ,vol. 39, pp. 1760- 1765 ,(1989) , 10.1103/PHYSREVB.39.1760
D. L. Medlin, T. A. Friedmann, P. B. Mirkarimi, P. Rez, M. J. Mills, K. F. McCarty, Microstructure of cubic boron nitride thin films grown by ion-assisted pulsed laser deposition Journal of Applied Physics. ,vol. 76, pp. 295- 303 ,(1994) , 10.1063/1.357143