Structure, mechanical and tribological properties of HfCx films deposited by reactive magnetron sputtering
作者： Wang Shuo , Zhang Kan , An Tao , Hu Chaoquan , Meng Qingnan
DOI: 10.1016/J.APSUSC.2014.11.130
关键词:
摘要: Abstract Hafnium carbide (HfC) films have been deposited on Si (1 0 0) substrates by direct current reactive magnetron sputtering. The microstructure, compressive stress, hardness and tribological behaviors show great dependence carbon (C) concentration chemical bonding state. With C content in HfC x rising, phase transforms from hexagonal-close-packed (HCP) Hf(C) to face-centered-cubic (FCC) HfC, nanocomposite structure consisting of nanocrystalline grains encapsulated amorphous (a-C) matrix forms at moderate content. increases significantly 10.4 GPa (14 at.% C) 34.4 GPa (58 at.% then keeps dropping with further increasing a-C appears more than 32 at.% it obviously lowers coefficient friction (COF). wear resistance can be remarkably worsened high stress. film 76 at.% exhibits relatively low good fracture toughness self-lubrication transfer layer, showing combination the lowest COF 0.10 rate 1.10 × 10 −6 mm 3 /Nm.
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