Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

摘要: Block copolymers with metals confined in one or more blocks are emerging as candidate materials for nanomanufacturing applications due to their unprecedented nanoscale pattern transfer capabilities. In this article we highlight recent developments metal-containing block terms of novel synthetic methodologies particular emphasis on sequential infiltration synthesis, hierarchical self-assembly from nano, meso, and submicron scales, an etch mask high-throughput, high-aspect-ratio nano meso scale patterning.