作者: Wei-Wei Wang , Jing-Shuang Dang , Xiang Zhao , Shigeru Nagase
DOI: 10.1039/C7NR04966H
关键词:
摘要: We introduce a mechanistic study based on controversial fullerene bottom-up growth model proposed by R. Saito, G. Dresselhaus, and M. S. Dresselhaus. The so-called SDD C2 addition has been dismissed as chemically inadmissible but here we prove that it is feasible via successive atomic-carbon-participated migration reactions. Kinetic calculations the formation of isolated pentagon rule (IPR)-obeying C70 Y3N@C80 are carried out employing for first time. A stepwise mechanism with considerably low barrier ca. 2 eV which about 3 lower than conventional isomerization-containing pathway.