Device for etching semiconductors with a large surface area
作者： Marc Christophersen , Kay Steen , Helmut Föll , Jörg Bahr , Georgi Popkirov
DOI:
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摘要: The device etches semiconductors with a large surface area in trough-shaped receptacle containing liquid electrolyte. A sample head is mounted inside the etching trough, and provided for holding at least one semiconductor wafer. tilted to promote turbulent electrolyte flow space between bottom of wafer top receptacle.
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