Selective Ablation of Thin Films by Pulsed Laser

作者: Andreas Ostendorf , Evgeny L. Gurevich , Xiao Shizhou

DOI: 10.1007/978-3-319-05987-7_9

关键词:

摘要: Laser direct patterning of thin films with minimal substrate damage is receiving attention in many industrial applications, e.g., photovoltaic or flat displays. Substantial progress has been made understanding the laser-matter interactions and reveals that laser-induced thermal effects are significantly critical most laser ablation processes. The penetration depth, determined by optical absorption subsequently diffusion length, heavily dependent on applied pulse duration. ratios between film thickness, depths separate to be film-like bulk-like behavior thin-film ablation.

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