Composition and microstructure of beryllium carbide films prepared by thermal MOCVD
作者： Yu-dan He , Jiang-shan Luo , Jia Li , Ling-biao Meng , Bing-chi Luo
DOI: 10.1016/J.FUSENGDES.2015.12.015
关键词:
摘要: Abstract Beryllium carbide films without columnar-crystal microstructures were prepared on the Si (1 0 0) substrate by thermal metal organic chemical vapor deposition using diethylberyllium as precursor. The influence of temperature composition and microstructure beryllium was systematically studied. Crystalline is always dominant phase according to XRD analysis. Meanwhile, a small amount α-Be exists in when below 400 °C, hydrocarbon or amorphous carbon beyond 400 °C. Surfaces morphology shows transition from domes cylinders, humps, tetraquetrous crystalline needles with increase temperature. No columnar grains are characterized throughout thickness revealed cross-section views. average densities these determined be 2.04–2.17 g/cm 3 . findings indicate has great influences Be 2 C grown MOCVD.
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