UV protection filters by dielectric multilayer thin films on Glass BK-7 and Infrasil 301

摘要: Abstract The increasing use of Ultraviolet (UV) light in medicine, industrial environments, for cosmetic use, and even consumer products necessitates that greater attention be paid to the potential hazards this type electromagnetic radiation. To avoid any adverse effects exposure radiation, four suitable protection filters were produced block three UV bands (UVA, UVB, UVC). design structure required dielectric multilayer was done by optical thin film technology using absorbing property radiation substrates materials. computer analyses filter formulas prepared Macleod Software production processes. deposition technique achieved on (Glass BK-7 Infrasil 301) material combinations including Titanium dioxide (Ti 2 O 3 ), Hafnium (HfO Lima (mixture oxides SiO /Al ); being an electron beam gun. output results theoretical experimental transmittance values spectral band from 200 nm 800 nm discussed analyze suitability ‘real world’ applications, test pieces subjected durability tests (adhesion, abrasion resistance, humidity) according Military Standard MIL-C-675C MIL-C-48497A.