The acid-base character of interactions between xenon and selected carboxylic and sulfonic acids

作者: Dawid Gąszowski , Marek Ilczyszyn

DOI: 10.1016/J.CHEMPHYS.2017.03.009

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摘要: Abstract Interactions of Xe atoms with RCO 2 H and RSO 3 (R = CH CF ) acids in different solvents are examined by analysis 129 chemical shifts extrapolated to zero solvent concentration. Obtained results very sensitive the contacts methyl trifluoromethyl groups as well carboxylic sulfonic acidity. The acid-base character these acid-Xe interactions is considered.

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