Microstructural stability of AlN diffusion barrier for nanocomposite Ni + CrAlYSiHfN coating on single crystal superalloy at high temperatures
作者： Pan Ren , Shenglong Zhu , Fuhui Wang
DOI: 10.1016/J.APSUSC.2015.10.096
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摘要: Abstract An AlN interlayer was fabricated by filtered vacuum arc evaporation as a diffusion barrier (DB) between Ni + CrAlYSiHfN composite coating and K417G superalloy. Microstructure changes of the DB were investigated after exposure at 1000 1100 °C. Amorphous structure found in as-deposited DB, which went through crystallization when exposing high temperature. The suppressed interdiffusion overlayer substrate effectively 200 h both 1000 °C A few element precipitates observed within grain boundary 1100 °C for 200 h.
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