Advanced illumination system for use in microlithography
作者： James Tsacoyeanes , Lev Ryzhikov , Walter Augustyn , Scott Coston , Mark Oskotsky
DOI:
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摘要: A system for microlithography comprises an illumination source; optical including, in order from objective side, (a) a first diffractive element that receives the source, (b) zoom lens, (c) second element, (d) condenser (e) relay and (f) reticle, projection imaging reticle onto substrate, wherein provides zoomable numerical aperture.
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