Nanoscale Electrical Contacts Grown by Focused Ion Beam (FIB)-Induced Deposition

摘要: A detailed description of the use focused ion beam (FIB) to grow electrical contacts is presented. The combination FIB with precursor compounds, which are delivered on area interest by means gas-injection systems, allows growth nanometric resolution targeted places. technique has been coined beam-induced deposition (FIBID). Pros and cons respect other existing techniques for contacting discussed. FIBID reported in this chapter based Pt W precursors, result deposits resistivities down 100 μΩ cm without any post-treatment. comparison electron deposition, sister that uses electrons instead ions, also steps follow order be successful process described. Examples individual nanowires nanoparticles carried out our laboratory shown, together corresponding four-probe transport measurements. Below 5 K, superconducting can therefore used zero-resistance lead contacts, superconductor-based nanocontacts probing proximity effects, opening new perspectives as described here.