作者: Joseph Buturlia , Robert F. Lynch , Mark P. Amrich , Jonathan L. Rolfe
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摘要: Method for producing a multiplicity of undercut micro recesses in surface an article, such that the article exhibits greater fractal area at level below than is exhibited surface. The method comprises applying maskant layer to selected removing loci expose underlying portions pattern, etchant exposed time sufficient etch and enable beneath remaining layer, provide condition with recesses, engineered pattern recesses.