Wettability of quartz controlled by UV light irradiation using an azobenzene surfactant
作者： Rui Dong , Xiaoming Jiang , Chunling Hao , Wei Xu , Huiyong Li
DOI: 10.1016/J.COLSURFA.2019.123586
关键词:
摘要: Abstract Solids having controllable wettabilty have received much attention due to their great importance in many industrial fields. In this paper, the quartz surfaces and particles with reversibly switchable wettability been studied. The of can be controlled by UV light irradiation presence an azobenzene surfactant (AZO). adsorption behavior AZO at quartz-liquid interface was investigated measurements surface tension, contact angle Zeta potential. process monitored crystal microbalance dissipation (QCM-D).The results show that has a strong tendency adsorb quartz–liquid interface. causes interfacial tension (γsl) decrease. from QCM-D frequency change (Δf) decreases loss (ΔD) increases when adsorbs onto surface. changes are very small layer is rigid. After irradiation, adsorbed surfactants desorbed partly decomposes, causing thickness
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