Developed profile of holographically exposed photoresist gratings.
作者： Bernardo de A. Mello , Ivan F da Costa , Carlos RA Lima , Lucila Cescato , None
DOI: 10.1364/AO.34.000597
关键词:
摘要: A simulation of the profile of holographically recorded structures in photoresists is … photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist …
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