作者: Mihail P. Petkov , Marc H. Weber , Kelvin G. Lynn , Kenneth P. Rodbell
DOI: 10.1063/1.1421090
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摘要: We present a straightforward and fast positron annihilation spectroscopy (PAS) technique for measuring the 2 to 3 photon ratio of Ps (electron-positron) atoms (3γ PAS), utilized here nondestructive characterization mesoporous (pore size >1 nm) dielectric films. Examples are given ∼1-μm-thick foamed methyl-silsesquioxane (MSSQ) films, produced by mixing MSSQ (0–90 wt % fraction) with sacrificial foaming agent (porogen). Probing these films as function depth allows one monitor escape from interconnected pores determine threshold pore interconnectivity film surface. A classical treatment diffusion is used calculate open closed porosity fractions initial porogen load.