Optoelectronic and structural properties of a-Ge1−xCx:H prepared by rf reactive cosputtering

作者: J. Vilcarromero , F. C. Marques , F. L. Freire

DOI: 10.1063/1.368093

关键词:

摘要: Optoelectronic, structural, and mechanical properties of hydrogenated amorphous germanium carbon (a-Ge1−xCx:H) alloys are presented. The films were prepared by the rf cosputtering technique using graphite-germanium composite targets. Films with contents in 0

参考文章(44)
Tatsuo Shimizu, Minoru Kumeda, Yoshinari Kiriyama, ESR and IR studies on sputtered amorphous Si–C–H, Si–Ge–H and Ge–C–H American Institute of Physics Conference Series. ,vol. 73, pp. 171- 175 ,(2008) , 10.1063/1.33070
Ruth Shinar, Hydrogen adsorption on some a‐Ge1−xCx:H films prepared by radio‐frequency sputtering Journal of Vacuum Science and Technology. ,vol. 6, pp. 2910- 2913 ,(1988) , 10.1116/1.575450
N. Saito, T. Yamaguchi, Preparation ofa‐SiC:H/a‐GeC:H superlattices by dual magnetron sputtering Journal of Applied Physics. ,vol. 66, pp. 3114- 3116 ,(1989) , 10.1063/1.344144
T. Shimizu, M. Kumeda, Y. Kiriyama, ESR studies on sputtered amorphous SiC, SiGe and GeC films Solid State Communications. ,vol. 37, pp. 699- 703 ,(1981) , 10.1016/0038-1098(81)91081-4
N. Saito, I. Nakaaki, T. Yamaguchi, S. Yoshioka, S. Nakamura, Influence of deposition conditions on the properties of a-GeC:H and a-Ge:H films prepared by r.f. magnetron sputtering Thin Solid Films. ,vol. 269, pp. 69- 74 ,(1995) , 10.1016/0040-6090(95)06671-3
J. Bullot, M. P. Schmidt, Physics of Amorphous Silicon–Carbon Alloys Physica Status Solidi B-basic Solid State Physics. ,vol. 143, pp. 345- 418 ,(1987) , 10.1002/PSSB.2221430202
S. B. White, D. R. McKenzie, An electron diffraction study of amorphous hydrogenated germanium‐carbon thin films Journal of Applied Physics. ,vol. 68, pp. 3194- 3197 ,(1990) , 10.1063/1.346369
A. R. Zanatta, I. Chambouleyron, Transport properties of nitrogen-doped hydrogenated amorphous germanium films Physical Review B. ,vol. 46, pp. 2119- 2125 ,(1992) , 10.1103/PHYSREVB.46.2119
R. Shinar, A. G. Entringer, J. Shinar, H.‐S. Wu, H. R. Shanks, The interaction of oxygen molecules with amorphous Ge, Ge:H, and some Ge:C:H alloys Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 7, pp. 2998- 3004 ,(1989) , 10.1116/1.576306