R-F electrodes for removably providing electrical energy to an apparatus during R-F energy reactive treatment processes

摘要: An R-F electrode apparatus is provided featuring self-adjusting, spring biased electrodes, removably attached to a removable substrate holder, within chamber used for plasma reactive treatment processes, particularly those involving semiconductor wafers. The further features base electrodes shaped and supported insure uniform transmission of electrical energy during operation. also provides an automatic means wiping, self-cleaning action between the contact surfaces opposing introduction removal holder from reaction chamber. are standard feedthroughs located in wall, which lead external power supply.