The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies

摘要: Abstract The nature of bonding in tetrahedral amorphous carbon nitride (ta-C:N) films deposited by filtered cathodic vacuum arc (FCVA) technique was studied with near edge X-ray absorption fine structure (NEXAFS), photoelectron and Raman spectroscopies. interpretation interrelation these spectra are discussed. changes the local were systematically as a function nitrogen content. Deconvolution C 1 s N XPS shows that sp 3 –C fraction decreases an increase π* peak at K (carbon K) (nitrogen edges studied. Comparison intensities π * confirms formation CN bond expense CC bond. Analysis NEXAFS revealed concentration increases, */ σ intensity ratio indicating there is amount relative to C–N bonds. parameters, such G width, I D / ratio, skewness line ( Q ), critically analysed terms content 2 films. We demonstrate combined study normalised Raman, very useful determining role incorporation ta-C hardness values, measured nanoindentation reduced higher (>7 at.%)