作者: Shunpei Yamazaki , Hiroki Adachi
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摘要: The present invention relates to a semiconductor device including circuit composed of thin film transistors having novel GOLD (Gate-Overlapped LDD (Lightly Doped Drain)) structure. transistor comprises first gate electrode and second being in contact with the insulating film. Further, is formed by using as mask, source drain regions are mask. Then, overlapping formed. This structure provides high reliability.