Apparatus for the reactive coating of a substrate
作者： Stephan Roegels , Joachim Szczyrbowski
DOI:
关键词:
摘要: A pair of magnetron cathodes in an evacuable coating chamber are each connected to ungrounded output A.C. power supply. The discharge voltage at least one the is measured and flow reactive gas into controlled so that identical a desired voltage.
lens.org 参考文章(14)
Joseph A. Bialko, John S. Lechaton, RF sputtering apparatus having floating anode shield ,(1977)
Jr John Louis Vossen, Rf sputtering apparatus and method ,(1972)
Varadachari Sadagopan, Jerome J Cuomo, Robert Rosenberg, Ashok F Mayadas, Method for sputtering garnet compound layer ,(1972)
Stephan Roegels, Joachim Szczyrbowski, Process and apparatus for reactively coating a substrate ,(1990)
Charles R. Condon, John Chapin, Feedback control for vacuum deposition apparatus ,(1978)
Stephen M. Bobbio, Yueh-Se Ho, Shared current loop, multiple field apparatus and process for plasma processing ,(1986)
A Lang, L Herte, Radio frequency sputter apparatus and method ,(1971)
George A. Shirn, William J. Pfister, Method of forming thin film resistor ,(1972)
Hans-Dieter Wurczinger, Arrangement for measuring the thickness of thin layers ,(1989)
Ulrich Patz, Rudolf Latz, Michael Scherer, Apparatus for coating a substrate with dielectrics ,(1988)