Garment marker system and method having computer assisted alignment with symmetric cloth patterns

作者: Thomas King , Craig L. Chaiken

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摘要: A method and apparatus for adjusting a marker in preparation cutting that is adapted use with fabrics having stripe or plaid patterns provide an axis of symmetry. The present invention characterized by computer assisted design matching provides either manual automatic alignment the garment segments computerized reference match locations on fabric web.

参考文章(4)
Vincente Calzado Requena, Antonio Romero Lledo, Mario Andrada Galan, Method and apparatus for matching panels to be cut from patterned fabrics ,(1987)
Shigeru Ando, Hirokazu Watanabe, Ken Aida, Hiroaki Morooka, Pattern processing system ,(1988)