Photosensitive elastomer composition

摘要: Disclosed is a photosensitive elastomer composition comprising (1) thermoplastic block copolymer at least one monovinyl substituted aromatic hydrocarbon polymer and conjugated diene block, wherein content (A) 10 to 35% by weight, the vinyl (V) of 20 50%, satisfy formula: 40≦(A)+(V)≦70; (2) an ethylenically unsaturated compound component; (3) photopolymerization initiator. This exhibits excellent photosensitivity, so that not only can time required for insolubilization be reduced about half which has conventionally been necessary, but also small dots lines surely formed without occurrence chipping development, thereby enabling advantageously used in fields printing plates, photoresists, screens screen printing. Especially when this production flexographic plate, flexible plate capable fine images obtained.