Comparison of surface oxidation of titanium nitride and chromium nitride films studied by x-ray absorption and photoelectron spectroscopy
作者： F. Esaka , K. Furuya , H. Shimada , M. Imamura , N. Matsubayashi
DOI: 10.1116/1.580764
关键词:
摘要: … monotonically decreases, whereas the N1(397)/Ti ratio at … molecular nitrogen because the binding energies of the NIII(402) … )/(NI(397)NII(398)) ratio in the XPS spectra and the (401.4 eV …
scitation.org
harvard.edu
cheric.org
aip.org参考文章(21)
E Huber, S Hofmann, High-temperature oxidation of (Ti,Pd)N and (Cr,Pd)N coatings studied with AES and XPS sputter depth profiling Vacuum. ,vol. 45, pp. 1003- 1005 ,(1994) , 10.1016/0042-207X(94)90005-1
F. Esaka, H. Shimada, M. Imamura, N. Matsubayashi, T. Sato, A. Nishijima, A. Kawana, H. Ichimura, T. Kikuchi, K. Furuya, X-ray absorption and X-ray photoelectron spectroscopic studies of air-oxidized chromium nitride thin films Thin Solid Films. pp. 314- 317 ,(1996) , 10.1016/S0040-6090(96)88640-8
Louis Porte, Laurent Roux, Jean Hanus, Vacancy effects in the x-ray photoelectron spectra of Ti N x Physical Review B. ,vol. 28, pp. 3214- 3224 ,(1983) , 10.1103/PHYSREVB.28.3214
C. Ernsberger, J. Nickerson, T. Smith, A. E. Miller, D. Banks, Low temperature oxidation behavior of reactively sputtered TiN by x‐ray photoelectron spectroscopy and contact resistance measurements Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 4, pp. 2784- 2788 ,(1986) , 10.1116/1.573679
J. Halbritter, H. Leiste, H.-J. Mathes, P. Walk, H. Winter, Quantitative photo electron spectroscopy of metallic compounds Solid State Communications. ,vol. 68, pp. 1061- 1064 ,(1988) , 10.1016/0038-1098(88)90822-8
C. R. Brundle, XPS and UPS studies of the interaction of nitrogen‐containing molecules with nickel: The use of binding energy patterns and relative intensities to diagnose surface species Journal of Vacuum Science and Technology. ,vol. 13, pp. 301- 309 ,(1976) , 10.1116/1.568833
B. Siemensmeyer, K. Bade, J. W. Schultze, XPS and Electrochemical Studies of Thin TiN Layers Berichte der Bunsengesellschaft für physikalische Chemie. ,vol. 95, pp. 1461- 1469 ,(1991) , 10.1002/BBPC.19910951128
H.Z. Wu, T.C. Chou, A. Mishra, D.R. Anderson, J.K. Lampert, S.C. Gujrathi, Characterization of titanium nitride thin films Thin Solid Films. ,vol. 191, pp. 55- 67 ,(1990) , 10.1016/0040-6090(90)90274-H
Harland G. Tompkins, Oxidation of titanium nitride in room air and in dry O2 Journal of Applied Physics. ,vol. 70, pp. 3876- 3880 ,(1991) , 10.1063/1.349194
L. Soriano, M. Abbate, J. C. Fuggle, P. Prieto, C. Jiménez, J. M. Sanz, L. Galán, S. Hofmann, Thermal oxidation of TiN studied by means of soft x‐ray absorption spectroscopy Journal of Vacuum Science and Technology. ,vol. 11, pp. 47- 51 ,(1993) , 10.1116/1.578718