Determination of secondary electron attenuation length to characterize electron blur (Conference Presentation)

摘要: EUV photon absorption by a resist film leads to emission of photoelectron and several low kinetic energy secondary electrons. The “universal curve”, used in X-ray spectroscopy, suggests that the electrons may travel tens hundreds nanometers solids until they inelastically scatter. fact long distances before initiate chemical reactions ultimately result blur aerial image, reducing contrast subsequently resolution resist. In this work, we will present an experimental approach determine electron attenuation length (EAL) – thickness material required reduce number emitted 1/e initial. EAL describes how far can is directly related blur. Possibilities gain additional information on penetration depth films also be discussed.