Disorder, band offsets and dopability of transparent conducting oxides

作者: John Robertson

DOI: 10.1016/J.TSF.2007.03.092

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摘要: N-type transparent conducting oxides are based on ionic with s-like cation conduction bands. The effect of disorder their band states is found to be small, because angular has no s states. Aliovalent impurities give rise shallow at the band, which leads an absence a tail localized This higher electron mobility than in typical p state amorphous materials like a-Si, ability move Fermi level well into and electrical instability as a-Si:H. offsets used suggest appropriate oxide dielectrics for thin transistors.

参考文章(54)
J Robertson, Electronic structure of SnO2, GeO2, PbO2, TeO2 and MgF2 Journal of Physics C: Solid State Physics. ,vol. 12, pp. 4767- 4776 ,(1979) , 10.1088/0022-3719/12/22/018
R. A. Street, Hydrogenated amorphous silicon Hydrogenated Amorphous Silicon. pp. 431- ,(1991) , 10.1017/CBO9780511525247
John Robertson, Electronic structure of amorphous semiconductors Advances in Physics. ,vol. 32, pp. 361- 452 ,(1983) , 10.1080/00018738300101571
G. Allan, C. Delerue, M. Lannoo, Electronic structure and localized states in a model amorphous silicon Physical Review B. ,vol. 57, pp. 6933- 6936 ,(1998) , 10.1103/PHYSREVB.57.6933
J. Robertson, K. Xiong, S. J. Clark, Band structure of functional oxides by screened exchange and the weighted density approximation physica status solidi (b). ,vol. 243, pp. 2054- 2070 ,(2006) , 10.1002/PSSB.200666802
E. Fortunato, A. Pimentel, A. Gonçalves, A. Marques, R. Martins, High mobility amorphous/nanocrystalline indium zinc oxide deposited at room temperature Thin Solid Films. ,vol. 502, pp. 104- 107 ,(2006) , 10.1016/J.TSF.2005.07.311
W. B. Jackson, R. L. Hoffman, G. S. Herman, High-performance flexible zinc tin oxide field-effect transistors Applied Physics Letters. ,vol. 87, pp. 193503- ,(2005) , 10.1063/1.2120895
Tadatsugu Minami, Transparent conducting oxide semiconductors for transparent electrodes Semiconductor Science and Technology. ,vol. 20, ,(2005) , 10.1088/0268-1242/20/4/004
Jasprit Singh, Influence of disorder on the electronic structure of amorphous silicon Physical Review B. ,vol. 23, pp. 4156- 4168 ,(1981) , 10.1103/PHYSREVB.23.4156
R. B. Wehrspohn, S. C. Deane, I. D. French, I. Gale, J. Hewett, M. J. Powell, J. Robertson, Relative importance of the Si–Si bond and Si–H bond for the stability of amorphous silicon thin film transistors Journal of Applied Physics. ,vol. 87, pp. 144- 154 ,(2000) , 10.1063/1.371836