Ion beam sputtering of x-ray multilayer mirrors

摘要: Ion beam sputtering has been applied for polishing, figuring and multilayer coating on silicon quartz glass substrates the fabrication of x-ray mirrors. For high-performance optics extremely low microroughnesses have to be achieved. Particularly d-spacing multilayers (d = 1...2 nm) even small improvements surface quality result in significant performance gains By ion polishing substrate surfaces could smoothed from 0.18 nm rms 0.11 (AFM scan length 5 μm). Furthermore spherical into elliptical or parabolic contours developed applied. Spherical with initial roughnesses 0.73 0.52 show reduced after 0.26 0.10 using AFM lengths 20 μm μm, respectively. The testing figured mirrors application as parallel focussing shows very promising results: comparison collimating mirrors, produced either by bending, similar intensities. However, figured mirrors open perspective further figure errors, improved long-term stability 2-dimensional focusing.