Solid state image pickup element and method of manufacturing a solid state pickup element

摘要: Provided is a solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution that created in forming color filters by common photolithography technique and which, when are formed split exposure, non-uniformity between exposure regions picked-up image, method of manufacturing same. The includes: applying negative type resist for first onto an entire surface given film; irradiation portions with light subsequent development; second while covering filters; irradiating area smaller than region surrounded development. Further, plural colors, one adjacent tapered at edges other filter reversely edges, allowing to fit each other. Furthermore, wedged