作者: K.M. Yang , Y.J. Wang , Q. Tang
DOI: 10.1016/0022-3093(88)90369-9
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摘要: The phase transition for amorphous GdTbFe film, prepared by magnetron sputtering, has been investigated the measurement of resistivity and analysis X-ray diffraction. Using plots from both Johnson-Mehl-Avrami Kissinger equations, parameters crystallization kinetics, δE n, are obtained. experimental results show that thermal stability GdTbfe is advantage over binary system, GdCo or GdFe.