In Situ Processing by Gas or Alkali Metal Dosing and by Cleavage

作者: Piero A. Pianetta

DOI: 10.1007/0-306-46913-8_6

关键词:

摘要: One of the most common experimental techniques used to study interaction molecules with surfaces is adsorption gas on a clean surface. In simplest version this technique, or otherwise prepared sample exposed given pressure for fixed amount time. The adsorbed surface then function dosage and sticking coefficient, s, particular molecule interest. When to, example, oxygen at P, number hitting per unit time area approximately

参考文章(108)
D.E. Ibbotson, T.S. Wittrig, W.H. Weinberg, The chemisorption and decomposition of NO on the (110) surface of iridium Surface Science Letters. ,vol. 110, pp. 294- 312 ,(1981) , 10.1016/0039-6028(81)90640-3
Peter Mark, Piero Pianetta, Ingolf Lindau, W.E Spicer, A comparison of LEED intensity data from chemically polished and cleaved GaAs(110) surfaces Surface Science. ,vol. 69, pp. 735- 740 ,(1977) , 10.1016/0039-6028(77)90151-0
H. Froitzheim, H. Ibach, On the question of surface states on cleaved GaAs(110) surfaces Surface Science. ,vol. 47, pp. 713- 716 ,(1975) , 10.1016/0039-6028(75)90221-6
P. Pianetta, I. Lindau, C. M. Garner, W. E. Spicer, Chemisorption and oxidation studies of the (110) surfaces of GaAs, GaSb, and InP Physical Review B. ,vol. 18, pp. 2792- 2806 ,(1978) , 10.1103/PHYSREVB.18.2792
Renyu Cao, Huan Tang, Piero A. Pianetta, Negative electron affinity on GaAs(110) with Cs and NF 3 : a surface science study SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation. ,vol. 2550, pp. 132- 141 ,(1995) , 10.1117/12.221412
M. Succi, R. Canino, B. Ferrario, Atomic absorption evaporation flow rate measurements of alkali metal dispensers Vacuum. ,vol. 35, pp. 579- 582 ,(1985) , 10.1016/0042-207X(85)90319-7
John J. Gilman, Direct Measurements of the Surface Energies of Crystals Journal of Applied Physics. ,vol. 31, pp. 2208- 2218 ,(1960) , 10.1063/1.1735524
P. K. Leavitt, P. A. Thiel, A warning concerning the use of glass capillary arrays in gas dosing: Potential chemical reactions Journal of Vacuum Science and Technology. ,vol. 8, pp. 148- 149 ,(1990) , 10.1116/1.577050