作者: Matthieu Lancry , Bertrand Poumellec
DOI: 10.1016/J.PHYSREP.2012.09.008
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摘要: Abstract Over the last two decades UV-induced Δ n profiling in SiO 2 glasses was widely used for production of in-fibre/waveguide Bragg grating-based (BG) optical devices photonics industry. These have found numerous applications fiber sensing, telecommunication and all laser systems. From a practical point view, it is most important photo-induced phenomenon observed each time silica glass exposed to convenient low or high UV intensity light through one quantum multi-photon mechanisms respectively. In fact, depending on materials, conditions exposure conditioning processes (i.e. the photosensitization process), induced index changes may vary from 10−5 up 10−2. following, purpose illustrating complexity this multiple-variable dependence, we present review how factors such as time, wavelength, sensitization process, pulse duration, chemical composition, can affect photosensitive response silica-based glasses, i.e. the number photons involved initial step absorption, writing efficiency so on.