Electrode substrate film and method of manufacturing the same

作者: Hideharu Okami

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摘要: [Object] Provided are an electrode substrate film which does not cause trouble in a process to create circuit pattern formed of metal thin line and the is less visible even under highly bright illumination, method manufacturing same. [Solving Means] An with transparent 52 laminate includes absorption layer 51 thickness 20 nm 30 inclusive as first layer, 50 second counted from side. Optical constants wavelength range (400 780 nm) satisfy conditions that refractive index 1.8 2.2 extinction coefficient 2.4 at 400 nm, 2.7 1.9 2.8 500 2.5 3.2 3.1 600 3.6 1.7 3.3 700 3.8 1.5 3.4 nm. The highest reflectance attributed reflection interface between 40% or less.

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