Fabrication of high frequency nanometer scale mechanical resonators from bulk Si crystals
作者： A. N. Cleland , M. L. Roukes
DOI: 10.1063/1.117548
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摘要: … stopped by timing the etch duration; we found that C2F6 did not etch Si at a … was electrically isolated from that deposited in the base of the substrates; … 3. SEM micrograph of an undercut …
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