Understanding the base development mechanism of hydrogen silsesquioxane
作者： Jihoon Kim , Weilun Chao , Brian Griedel , Xiaogan Liang , Mark Lewis
DOI: 10.1116/1.3250261
关键词:
摘要: The authors study the dissolution mechanism of hydrogen silsesquioxane in base solutions with addition chloride salts to elucidate development mechanism. reaction mechanisms are proposed based on quartz. Development kinetics suggests two dose-dependent mechanisms. Considering ion sizes, both hydrated and nonhydrated, exchange, they propose that a combination surface dominated at higher doses matrix lower accounts for high contrast NaOH base/NaCl salt mixture. interplay between nonhydrated sizes leads developers, such as tetramethyl ammonium hydroxide NaCl.
scitation.org
harvard.edu
aip.org
sci-hub.se 参考文章(19)
Joel KW Yang, Karl K Berggren, None, Using high-contrast salty development of hydrogen silsesquioxane for sub-10‐nm half-pitch lithography Journal of Vacuum Science & Technology B. ,vol. 25, pp. 2025- 2029 ,(2007) , 10.1116/1.2801881
Akitomo Tachibana, Tasuku Yano, Quantum chemical study of silicon oxide surface reaction with (poly)silane Applied Surface Science. pp. 61- 66 ,(1997) , 10.1016/S0169-4332(97)80052-9
M. Häffner, A. Haug, A. Heeren, M. Fleischer, H. Peisert, T. Chassé, D. P. Kern, Influence of temperature on HSQ electron-beam lithography Journal of Vacuum Science & Technology B. ,vol. 25, pp. 2045- 2048 ,(2007) , 10.1116/1.2794324
Falco C. M. J. M. van Delft, Jos P. Weterings, Anja K. van Langen-Suurling, Hans Romijn, Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 18, pp. 3419- 3423 ,(2000) , 10.1116/1.1319682
Peter Schwaderer, Enno Funk, Frank Achenbach, Johann Weis, Christoph Bräuchle, Jens Michaelis, Single-molecule measurement of the strength of a siloxane bond. Langmuir. ,vol. 24, pp. 1343- 1349 ,(2008) , 10.1021/LA702352X
Song Hi Lee, Jayendran C. Rasaiah, MOLECULAR DYNAMICS SIMULATION OF IONIC MOBILITY. I: ALKALI METAL CATIONS IN WATER AT 25 C Journal of Chemical Physics. ,vol. 101, pp. 6964- 6974 ,(1994) , 10.1063/1.468323
Shazia Yasin, D.G. Hasko, H. Ahmed, Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography Microelectronic Engineering. ,vol. 61, pp. 745- 753 ,(2002) , 10.1016/S0167-9317(02)00468-9
M. Deleuze, A. Goiffon, A. Ibanez, E. Philippot, Solvent Influence on Kinetics and Dissolution Mechanism of Quartz in Concentrated Basic Media (NaOH, KOH, LiOH) Journal of Solid State Chemistry. ,vol. 118, pp. 254- 260 ,(1995) , 10.1006/JSSC.1995.1341
W. Henschel, Y. M. Georgiev, H. Kurz, Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 21, pp. 2018- 2025 ,(2003) , 10.1116/1.1603284
Weilun Chao, Bruce D. Harteneck, J. Alexander Liddle, Erik H. Anderson, David T. Attwood, Soft X-ray microscopy at a spatial resolution better than 15 nm Nature. ,vol. 435, pp. 1210- 1213 ,(2005) , 10.1038/NATURE03719