Ion sources for nanofabrication and high resolution lithography

摘要: Ion sources that are used to produce nanometer resolution patterns directly on the substrate either point or volume plasma sources. The in focused ion beam systems which focus an image of sample. These are, practice gallium liquid metal. Other sources, such as gas field also being considered. Volume with projection, where instead a source, "back illuminated" stencil mask is projected substrate. operation, application, and characteristics three types reviewed compared.