Effect of Al/Cu ratios on the optical, electrical, and electrochemical properties of Cu-Al-Ca-O thin films
作者： I-Chun Cheng , Shih-Hang Chang , Guan-Wei Lin , Chu-Te Chi , Sou-Hui Hsiao
DOI: 10.1016/J.JALLCOM.2014.04.146
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摘要: Abstract This study systematically investigated the effect of various Al/Cu ratios on optical, electrical, and electrochemical properties sputter-deposited CuAlx−0.2Ca0.2O (x = 1, 1.25, 1.5, 1.75, 2) thin films. The as-sputtered Cu–Al–Ca–O films were all amorphous regardless ratio. Both transmittance resistivity increased with increasing ratios. Heterojunction diodes fabricated using Al-doped ZnO, exhibited high breakdown-voltage values when Optimal rectification ratio electrical determined in that had CuAl1.3Ca0.2O as their p-layer deposited film. low average corrosion current density (icorr) breakdown-voltages (Ebr) values, indicating resistance film increases
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