In situ x-ray photoelectron spectroscopic study of remote plasma enhanced chemical vapor deposition of silicon nitride on sulfide passivated InP
作者： W. M. Lau
DOI: 10.1116/1.584977
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摘要: … and one monolayer of phosphorus … a monolayer of sulfide, exposure to sulfide vapor could cause more sulfide formation. For example, about two monolayers of sulfur were found on InP …
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