Effective reactive pulsed magnetron sputtering of aluminium oxide – Properties of films deposited utilizing automated process stabilizer
作者： Artur Wiatrowski , Sergiusz Patela , Piotr Kunicki , Witold Posadowski
DOI: 10.1016/J.VACUUM.2016.09.021
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摘要: Abstract The formation of dielectric composites on a target surface (target poisoning) reduces the deposition rate reactive magnetron process in comparison to metals. One way minimizing this reduction is shifting operating point from transient mode. goal paper show that stable efficient aluminium oxide can be carried out An automated stabilizer driven by electrical parameter power supply was used for stabilization. approach stabilization mode resulted about seven times higher than standard and only two lower aluminium. optical properties thus obtained films were studied means ellipsometric analysis. model film structure, consisting stoichiometric oxide, metallic inclusions voids, proposed dispersion characteristics calculated. complex refractive index similar those typical deposited during pulsed sputtering process.
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