Film removal method, photoelectric conversion device manufacturing method, photoelectric conversion device, and film removal device
作者： Masahiro Toyokawa , Shinsuke Tachibana , 立花 伸介 , 雅博 豊川
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摘要: A film (3) formed on a substrate (2) is irradiated with first light beam to divide the into multiple regions. repair (RP1) performed by removing at defective removal places (DP) where remains between Thus, it possible provide method whereby can be divided regions high yield, and for manufacturing photoelectric conversion device (1) (60) which use said method.
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