Nanoindentation Investigation of HfO2 and Al2O3 Films Grown by Atomic Layer Deposition
作者： K. Tapily , J. E. Jakes , D. S. Stone , P. Shrestha , D. Gu
DOI: 10.1149/1.2919106
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摘要: … using atomic layer deposition (ALD) on (100) p-type Si wafers. Using nanoindentation and the … ALD thin films were measured to have a hardness of and a modulus of , whereas the …
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