Method of making micron or submicron cavities
作者： Stéphane Caplet , Claude Venin
DOI:
关键词:
摘要: The invention relates to a method of forming micron or submicron cavity walls, comprising: - the formation, on transparent support (10, 12, 14) photolithoetching mask, deposition layer resin (18) photosensitive material face, termed front which supports irradiation photosensitive through rear face (10') support, development obtain said walls.
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