Wafer processing apparatus, method of operating the same and wafer detecting system

作者: Osamu Tanigawa , Kenichi Yamaga , Masahiro Miyashita , Yuji Ono

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摘要: A closed-type cassette is mounted on a stand disposed in working region at position corresponding to an opening formed wall separating the from loading region. When stand, detecting device gives signal that effect controller. Then, controller closes valve interrupt nitrogen gas supply into lid of opened 20 30 sec after interruption and, then, resumed. The pressure difference between and interior decreased by interrupting region, so can be easily opened.

参考文章(20)
Edward F. Boyle, Gregory G. Baker, Wafer monitoring device ,(1987)
Timothy B. Vaughn, Billy R. Masten, David R. Vaughn, Robert S. Blackwood, Substrate location and detection apparatus ,(1993)
Shoichi Abe, Kiyotaka Akiyama, Tutomu Hiroki, Tsutomu Satoyoshi, Apparatus for detecting and aligning a substrate ,(1995)
Eugene Gantvarg, Victor Belitsky, Ilya Perlov, Eric A. Nering, Wafer cassette load station ,(1998)