Tungsten segregation in α2 + γ titanium aluminides

作者: D.J. Larson , C.T. Liu , M.K. Miller

DOI: 10.1016/S0966-9795(97)00026-5

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摘要: Atom probe field ion microscopy investigations of α2 + γ Ti-47%Al-2%Cr-l.8%Nb doped with 0.15% B and 0.2% W indicate that the tungsten segregates to both γγ α2γ interfaces. The interfacial coverage at a specific interface was estimated be 2.3% which yields segregation enhancement factor ~ 14. Initial results give no appreciable evidence boron interphase Interfacial supports previous observation additions stabilize lamellae against dissolution during aging.

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