作者: G.H Siegel
DOI: 10.1016/0022-3093(74)90002-7
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摘要: Abstract Ultraviolet spectroscopy is a useful experimental tool for the determination of electronic structure glasses. This paper discusses ultraviolet spectra SiO2 and high-purity silicate It considers in turn, absorption intrinsic to SiO network, effects network modifiers, impurity-induced absorption, luminescence radiation damage, both permanent transient, wavelength region extending from 90 350 nm.