Negative Capacitance in Organic/Ferroelectric Capacitor to Implement Steep Switching MOS Devices.

作者: Jaesung Jo , Woo Young Choi , Jung-Dong Park , Jae Won Shim , Hyun-Yong Yu

DOI: 10.1021/ACS.NANOLETT.5B01130

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摘要: Because of the “Boltzmann tyranny” (i.e., nonscalability thermal voltage), a certain minimum gate voltage in metal–oxide–semiconductor (MOS) devices is required for 10-fold increase drain-to-source current. The subthreshold slope (SS) MOS is, at best, 60 mV/decade 300 K. Negative capacitance organic/ferroelectric materials proposed order to address this physical limitation technology. Here, we experimentally demonstrate steep switching behavior device—that SS ∼ 18 (much less than mV/decade) K—by taking advantage negative stack. This capacitance, originating from dynamics stored energy phase transition ferroelectric material, can achieve step-up conversion internal amplification device). With aid series-connected capacitor as an assistive device, surface potential device becomes higher ...

参考文章(17)
Asif Islam Khan, Debanjan Bhowmik, Pu Yu, Sung Joo Kim, Xiaoqing Pan, Ramamoorthy Ramesh, Sayeef Salahuddin, Experimental evidence of ferroelectric negative capacitance in nanoscale heterostructures Applied Physics Letters. ,vol. 99, pp. 113501- ,(2011) , 10.1063/1.3634072
Ankit Jain, Muhammad Ashraful Alam, Prospects of Hysteresis-Free Abrupt Switching (0mV/dec) in Landau Switches arXiv: Mesoscale and Nanoscale Physics. ,(2013) , 10.1109/TED.2013.2286997
Asif Islam Khan, Korok Chatterjee, Brian Wang, Steven Drapcho, Long You, Claudy Serrao, Saidur Rahman Bakaul, Ramamoorthy Ramesh, Sayeef Salahuddin, Negative capacitance in a ferroelectric capacitor. Nature Materials. ,vol. 14, pp. 182- 186 ,(2015) , 10.1038/NMAT4148
Sayeef Salahuddin, Supriyo Datta, Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices Nano Letters. ,vol. 8, pp. 405- 410 ,(2008) , 10.1021/NL071804G
Victor V. Zhirnov, Ralph K. Cavin, Nanoelectronics: negative capacitance to the rescue? Nature Nanotechnology. ,vol. 3, pp. 77- 78 ,(2008) , 10.1038/NNANO.2008.18
G. Bai, R. Li, Z. G. Liu, Y. D. Xia, J. Yin, Tuned dielectric, pyroelectric and piezoelectric properties of ferroelectric P(VDF-TrFE) thin films by using mechanical loads Journal of Applied Physics. ,vol. 111, pp. 044102- ,(2012) , 10.1063/1.3685750
Wei Jin Hu, Deng-Ming Juo, Lu You, Junling Wang, Yi-Chun Chen, Ying-Hao Chu, Tom Wu, Universal Ferroelectric Switching Dynamics of Vinylidene Fluoride-trifluoroethylene Copolymer Films Scientific Reports. ,vol. 4, pp. 4772- 4772 ,(2015) , 10.1038/SREP04772
YG Xiao, ZJ Chen, MH Tang, ZH Tang, SA Yan, JC Li, XC Gu, YC Zhou, XP Ouyang, None, Simulation of electrical characteristics in negative capacitance surrounding-gate ferroelectric field-effect transistors Applied Physics Letters. ,vol. 101, pp. 253511- ,(2012) , 10.1063/1.4772982
Andrés Godoy, Enrique Miranda, David Jimenez, Erratum: Analytic Model for the Surface Potential and Drain Current in Negative Capacitance Field-Effect Transistors IEEE Transactions on Electron Devices. ,vol. 57, pp. 2405- 2409 ,(2010) , 10.1109/TED.2010.2062188